Global Extreme Ultraviolet Lithography Market had a value of USD 12.15 Billion in 2024 and expected it to hit USD 27.51 Billion by 2030, with a CAGR of 14.6 % during the forecast period.

Extreme Ultraviolet Lithography Market Overview

Extreme Ultraviolet (EUV) lithography market was the production-grade resolution technology, printing critical layers for sub-10 nm logic and memory chips. Its practical performance can be expressed with concrete engineering numbers. Production NXE-class scanners used in high-volume fabs deliver wafer throughputs typically in the low-hundreds of wafers per hour (examples quoted for NXE platforms are ≳125 wph for earlier NXE tools and ≳170 wph for later NXE variants). EUV light-source power a primary driver of throughput has reached production levels around ~250 watts in mass-production tools, with roadmaps targeting several hundred watts more to further raise throughput. In 2023–24 ASML remained the dominant commercial supplier: recent public reporting shows the company selling dozens of EUV systems, underscoring how EUV is concentrated in a limited set of leading fabs and toolsets.

From a 2024 Extreme Ultraviolet (EUV) lithography market capital-and-deployment viewpoint the numbers emphasized scarcity and scale the first High-NA (0.55 NA) EXE modules were shipped into production assembly in late 2023 and additional High-NA deliveries continued into 2024, but total High-NA units remained in the single-digit to low-double-digit range during that period. High-NA systems carry very large price tags (reported around €350 million per unit in public accounts) and consequently initial fleets had small and tightly allocated to a few customers while fabs qualify the new tool family. Meanwhile Extreme Ultraviolet lithography industry engineering metrics to watch remained concrete and measurable wafers/hour, source power in watts, and the small integer count of deployed High-NA machines all of which shaped the global Extreme Ultraviolet (EUV) lithography market in 2024.

This extensive analysis by Jadhavar Business Intelligence Pvt Ltd provides consumers with a complete and actionable picture of the Global Extreme Ultraviolet Lithography Market, including market size, share, trends, and growth estimates from 2024 to 2030. It provides a complete overview of important locations and countries by Equipment, End-User. Clients receive comprehensive market dynamics, business tool analysis (PORTER and PESTLE), a Technology roadmap, and regulatory updates. The study also includes country-specific projections, competitive benchmarking, Company profiles, and M&A activity, all of which aid in strategic planning, market entry analysis, and competitor positioning.

Extreme Ultraviolet Lithography Market Dynamic’s

The EUV lithography market had significant growth in 2024 from increased requirements for new advanced semiconductor nodes below 5 nm that are single-exposure EUV layers, and multi-dimensional (2 or 3) which require multiple EUV exposures. The large semiconductor manufacturers like TSMC, Samsung, and Intel, are collectively investing billions of dollars to access EUV-enabled production systems and EUV technology. In 2023, ASML noted that they shipped 53 EUV systems and then more shipments in 2024 to support those integrated circuit (IC) manufacturing sites and their relation to EUV production for a given capacity and to maintain shorts stories otherwise tied to traditional 193nm processes. The cadence of acceptance once achieved on the EUV lithography market was fueled through the demand for logic density and furthermore the (mandating) AI and High-Performance computing chips requiring logic densities above 150 million transistors (typologies per) mm².

As of 2024, the Extreme Ultraviolet (EUV) lithography industry has limitations like, largely tied to cost, use complexity. One of the more frequently cited numbers for the cost of each EUV tool is €350 million (on average), limiting the option of introducing EUV in prior generations for high volume production, even for the most advanced fabs. In Extreme Ultraviolet (EUV) lithography Market industry, while the production throughput has uncertainly shown some improvement forcing an estimated high value throughput of 125-80 waf/hr, the limitation is severed by being at the mercy of the lower production throughput of the current high value production option (DUV) limiting adoption algorithm in high value production runs, particularly at the leading and trailing edges of production turn arounds.  If the extreme difficulty of the adoption had a more significant meaning, these volumes of numbers tell a reasonable story of how though Extreme Ultraviolet (EUV) lithography industry has demonstrated itself to the industry as irrevocable the recent cycle of capital asset introduction to the industry is deliberate and cautious.

The shift to High-NA EUVs (0.55 NA) which can pattern below 2 nm nodes with fewer processes is the key opportunity in the Extreme Ultraviolet (EUV) lithography market in 2024. The early shipments of these tools were varied plentiful and are expected to include around €350 million in machinery options sold, and will represent a viable growth opportunity as leading fabs define their next steps to 2 nm and below. With expanding AI accelerators, expanding 5G infrastructure, and expanding advanced memory all requiring transistor densities over 150 M/mm² the demand for Extreme Ultraviolet (EUV) lithography market had an opportunity to stabilize as the baseline semiconductor manufacturing technology.

As for 2024, recent developments in the Extreme Ultraviolet (EUV) lithography market road map shows progress through two events (1) ASML's shipment of yet another High-NA EUV system (≈€350M each) (2) imec's launch of a joint High-NA EUV lab in the Netherlands. The impact of these developments provided early ecosystem research and integration with chip designers and fabricators. When SK hynix built the major first commercial High-NA EUV machine in the industry, the industry made notable progress as Hynix continued to build at the M16 fab, in South Korea with real manufacturing intended to take place after additional pilot testing. Each signifies that the Extreme Ultraviolet (EUV) lithography market is ready to drive toward a sub-2 nm node, and use EUV to render as a significant contributor to next generation AI, 5G and advanced memory chips.

Extreme Ultraviolet Lithography Market Segment Analysis

The Extreme Ultraviolet Lithography Market is segmented into Equipment and End-User.

By Equipment

Based on Equipment segment the Extreme Ultraviolet Lithography Market is segmented into Light Source, Optics, Mask andOthers. Light Source has the largest market share of Extreme Ultraviolet Lithography Market, accounted for 40 % of the total Equipment segment in 2024. This dominance is driven by, the light source is the most complex component of the Extreme Ultraviolet Lithography Market in terms of all of the other components in the system. If we under the light sources that a normal lithography scanner could draw of a total power of at least 250 watts before parts could generate detectable EUV light (bottom) and throughput of 125 - 170 wafers /hour-- AND when we crowd the engineering challenge of creating something to not only generate and stabilize EUV light at 13.5 nm; and therefore scale, making it incredibly expensive, plus there a lot of parts that need to be invented and manufactured (not just the light source) to invent and manufacture an Extreme Ultraviolet Lithography Market.

Extreme Ultraviolet Lithography Market Region analysis

In 2024, the Asia-Pacific region dominated as the largest region in the Extreme Ultraviolet Lithography Market, representing approximately 65% of global adoption. This is dominance was driven by the large number of semiconductors fabs in Taiwan, South Korea, and Japan, such as TSMC, Samsung, and other significant fabs, which have increased EUV investments enabling production below the 5nm node with reach towards the 2nm node. TSMC already represents greater than half of the global installed base of EUV tool deployments globally. The region's leadership was also be helped by an increasing level of Extreme Ultraviolet Lithography Market capital spending over tens of billions per year on EUV enabled fabs, and will establish the Asia-Pacific region as the key driver for European Union Version in 2024.

North America, as well as Europe, represent the rest of the share. North America had a large share which is supported by Intel's EUV technology on advanced nodes, and Europe is also important since ASML is the only global EUV, major supplier which is based in the Netherlands. North America was growing mainly through U.S. CHIPS Act incentives and Intel ramping to 18A and below while simultaneously, Europe and ASML are well positioned to take advantage of the manufacturing and R&D ecosystem to support the global EUV supply chain. North America and Europe had a smaller share than Asia-Pacific, but both territories remain relevant to technology innovation, equipment supply, and ecosystem to the global EUV sector.

Extreme Ultraviolet Lithography Market Competitive Analysis

ASML Holding N.V. was the dominated leader in the global Extreme Ultraviolet (EUV) lithography market place for two reasons, it has a 95.5% market share in 2024 since they are the sole supplier of production grade EUV scanners. ASML Holding N.V. has achieved this position after a lot of development and collaboration including the optics partner, Carl Zeiss SMT, and the light-source technology partner includes Cymer their wholly-owned subsidiary. Other companies do not manufacture complete systems that are production grade with EUV, their competitors are just component representatives for the EUV ecosystem. The light source is the largest value component of the EUV system (46.3% of the generates value). The light source was a complex and alternative (expensive) manufacturing process with several companies supporting this process including Gigaphoton, Ushio, and others along with Cymer.

At the same time, materials companies such as TOK, JSR, Shin-Etsu, and Merck KGaA provide advanced photoresists and chemicals, while Toppan/DNP, Photronics, and HOYA supply EUV mask blanks and reticles. Together, these players form a tightly integrated ecosystem around ASML, but the Extreme Ultraviolet Lithography Market itself remains exclusively under ASML’s control in 2024.

Report Summary

In 2024, the Extreme Ultraviolet (EUV) Lithography market emerged as the cornerstone technology for sub-10 nm semiconductor manufacturing, powering advanced logic, memory, AI, and high-performance computing chips. ASML Holding N.V. maintains a 95.5% share in production-grade EUV scanners, supported by critical ecosystem partners like Carl Zeiss SMT, Cymer, and Gigaphoton. The light source segment leads equipment value at 40%, reflecting its complexity and central role in throughput mark a pivotal growth opportunity. With increasing AI, 5G, and advanced memory demand, the market is poised for rapid expansion, underscoring EUV lithography as the backbone of next-generation semiconductor innovation.

Extreme Ultraviolet Lithography Market Scope:

Extreme Ultraviolet Lithography Market Key Players –

·       ASML Holding N.V.

·       Carl Zeiss SMT

·       Cymer (ASML subsidiary)

·       Gigaphoton

·       TRUMPF

·       Ushio

·       Canon Inc.

·       Nikon Corporation

·       KLA Corporation

·       Tokyo Ohka Kogyo (TOK)

·       JSR Corporation

·       Shin-Etsu Chemical

·       Merck KGaA

·       Toppan / Dai Nippon Printing (DNP)

·      Photronics / HOYA

Frequently Ask Questions –

1) Who are the major Key players of Extreme Ultraviolet Lithography Market?

Ans - The Major Key players of Extreme Ultraviolet Lithography Market are ASML Holding N.V., Carl Zeiss SMT, Cymer (ASML subsidiary), Gigaphoton and TRUMPF.

2) Which Region accounted highest share of the Extreme Ultraviolet Lithography Market in 2024?

Ans – Asia Pacific region accounted highest share of the Extreme Ultraviolet Lithography Market.

3) What was the market size of Extreme Ultraviolet Lithography Market in 2024?

Ans – In 2024, market size of the Extreme Ultraviolet Lithography Market is USD 12.15 Billion.

4) Which Segment is expected to lead the market during forecast period?

Ans – Equipment Segment is the top segment hold the largest share in Extreme Ultraviolet Lithography Market during forecast period.

5) What will be the market size of Extreme Ultraviolet Lithography Market in 2030?

Ans - The market size of Extreme Ultraviolet Lithography Market in 2030 will be USD 27.51Billion.